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  SEMI C063 - Guideline for Organosilicate Precursors Used in Low K CVD Processes
 
 
SEMI International Standards

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Description
 

This standard was technically approved by the global Liquid Chemicals Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on September 5, 2007. It was available at www.semi.org in October 2007 and on CD-ROM in November 2007.

The purpose of this document is to provide guidelines for organosilicate precursors used in Low K CVD processes for which a need has been identified.

The scope of this document lists the proposed impurity limits for organosilicate precursors (e.g., Dimethyldimethoxysilane, Octamethylcyclotetrasiloxane, Diethoxymethylsilane, Tetramethylcyclotetrasiloxane) used in the semiconductor industry.

Referenced SEMI Standards
None.

Revision History
SEMI C63-1107 (first published)

 

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