This specification was technically approved by the Global Gases Committee and is the direct responsibility of the North American Gases Committee. Current edition approved by the North American Regional Standards Committee on August 29, 2002. Initially available at www.semi.org September 2002; to be published November 2002. Originally published in 1989; previously published in 1992.

The purpose of this document is to provide a specification for Disilane (Si2H6) used in the semiconductor industry. This document covers requirements for Disilane (Si2H6) used in the semiconductor industry. If analytical methods are not complete, the requirements are presented as a guideline.

Referenced SEMI Standards
SEMI C1 — Specifications for Reagents
SEMI C3 — Specifications for Gases

Revision History
SEMI C3.34-1102 (technical revision)
SEMI C3.34-92 (technical revision)
SEMI C3.34-90 (technical revision)
SEMI C3.34-89 (first published)