This specification was technically approved by the Global Gases Committee and is the direct responsibility of the North American Gases Committee. Current edition approved by the North American Regional Standards Committee on November 4, 2004. Initially available at www.semi.org January 2005; to be published March 2005.

NOTICE: This document replaced C3.18 and C3.31 in 2005.

The purpose of this document is to provide a series of specifications for different grades of dichlorosilane (SiH2Cl2) that are used in the semiconductor industry. This document covers requirements for all grades of dichlorosilane (SiH2Cl2) used in the semiconductor industry. If analytical methods are not complete, the requirements are presented as a guideline.

Referenced SEMI Standards
None.

Revision History
SEMI C56-0305 (first published)