This standard was technically approved by the global Micropatterning Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on November 21, 2006. It was available at www.semi.org in February 2007 and on CD-ROM in March 2007. Originally published in 1993; previously published June 1999.

NOTICE: This document was completely rewritten in 2007.

The purpose of this guideline is to establish standard nomenclature for photomask defect classifications, and to define defect sizing methods. Within this document only the word “photomask” will be used, but it is meant to be interchangeable with the word “reticle”. It is desirable to follow this guideline when discussing classification, nomenclature, and size of the photomask defects.

Referenced SEMI Standards
None.

Revision History
SEMI P22-0307 (technical revision)
SEMI P22-0699 (technical revision)
SEMI P22-0093 (first published)